PTFE(Teflon) Labware
PTFE Circular Wafer Carrier 6 Inch Acid Alkali Resistant Semiconductor Cleaning Basket Customizable
Item Number : PL-CP207
Price varies based on specs and customizations
- Material Composition
- High-Purity Virgin PTFE / Customizable PFA
- Chemical Resistance
- Universal Acid, Alkali, and Solvent Resistance
- Manufacturing Process
- Full Custom CNC Machining and Fabrication
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Product Overview


This high-purity substrate handling system is engineered specifically for the rigorous demands of semiconductor fabrication and advanced wet chemistry environments. Designed to facilitate the safe and efficient cleaning, etching, and rinsing of 6-inch (150mm) wafers, this unit serves as a critical interface between delicate silicon substrates and aggressive chemical reagents. By utilizing premium-grade fluoropolymer construction, the system ensures that contamination risks are minimized while maintaining structural integrity in the most volatile processing conditions. The circular geometry is optimized for compatibility with standard process tanks, providing a secure and stable platform for high-value components.
Primarily utilized in the microelectronics, solar energy, and compound semiconductor industries, the equipment excels in multi-stage cleaning protocols including RCA clean, piranha etching, and hydrofluoric acid (HF) dips. It is indispensable for facilities performing photolithography, chemical mechanical polishing (CMP) post-processing, and ultrasonic substrate agitation. The design focuses on maximizing fluid exchange and drainage, ensuring that reagents contact every surface of the wafer uniformly while preventing the entrapment of contaminants or stagnant liquid between processing steps.
Engineers and procurement teams can rely on this unit for long-term operational consistency. Unlike standard plastics that may degrade or leach ions when exposed to concentrated acids and elevated temperatures, this system leverages the unique molecular stability of high-performance fluoropolymers. The result is a robust, non-reactive carrier that withstands repeated thermal cycling and prolonged immersion without compromising the purity of the chemical bath or the integrity of the wafers being processed. Every unit is a testament to precision CNC fabrication, reflecting a commitment to technical excellence in laboratory and industrial fluid handling.
Key Features
- Superior Chemical Inertness: Constructed from premium PTFE, the system is virtually unaffected by almost all industrial chemicals, including concentrated sulfuric acid, nitric acid, and strong alkaline solutions, ensuring zero contamination of the process stream.
- Optimized Fluid Dynamics: The carrier features precision-machined slots and flow-through ports designed to facilitate rapid reagent penetration and complete drainage, which is essential for uniform etching and streak-free drying.
- Thermal Stability Range: This unit maintains its mechanical strength and dimensional stability across a wide temperature spectrum, allowing for seamless transition between chilled etching baths and heated cleaning cycles without warping.
- Low Surface Energy: The naturally non-stick properties of the fluoropolymer material prevent the adhesion of particulates and organic residues, making the equipment easy to clean and maintain at semiconductor-grade purity levels.
- Precision CNC Fabrication: Each basket is manufactured using advanced CNC machining techniques, ensuring ultra-smooth surfaces and tight tolerances that prevent physical stress or scratching on delicate wafer edges.
- High-Purity Material Sourcing: We utilize only virgin, high-molecular-weight PTFE, which is inherently free of fillers, pigments, and metallic impurities, meeting the stringent requirements of sub-micron fabrication facilities.
- Ergonomic and Modular Design: The circular frame is engineered for easy manual handling or integration with automated robotic arms, featuring secure grip points that minimize the risk of operator error during high-stakes transfers.
- Mechanical Durability: Despite its chemical softness, the structural design of the basket provides excellent impact resistance and load-bearing capacity, ensuring it can support full batches of wafers through high-speed rinsing or ultrasonic agitation.
Applications
| Application | Description | Key Benefit |
|---|---|---|
| RCA Cleaning Process | Used to remove organic residues, thin oxide layers, and ionic contamination from silicon wafers using SC-1 and SC-2 solutions. | High thermal and chemical resistance prevents carrier degradation during heated bath immersion. |
| Piranha Etching | Handling wafers in a mixture of sulfuric acid and hydrogen peroxide to remove heavy organic matter. | Exceptional resistance to aggressive oxidative environments ensures long equipment service life. |
| Hydrofluoric (HF) Acid Dips | Removal of sacrificial oxide layers or native oxides from silicon surfaces in varying concentrations of HF. | Material purity prevents the introduction of metallic ions into the sensitive etching environment. |
| Post-CMP Rinsing | Transporting wafers through cleaning cycles following Chemical Mechanical Polishing to remove slurry particles. | Smooth, non-stick surfaces prevent particle entrapment and facilitate effective ultrasonic cleaning. |
| Solar Cell Fabrication | Processing 6-inch monocrystalline or polycrystalline silicon wafers during texturing and phosphorus diffusion steps. | Robust construction supports high-volume throughput in demanding industrial production lines. |
| Photolithography | Supporting substrates during the developing and stripping of photoresist using solvents and specialized strippers. | Universal solvent compatibility prevents swelling or softening of the carrier frame. |
| Ultrasonic Cleaning | Carrying delicate components in ultrasonic or megasonic baths for high-precision contaminant removal. | Structural rigidity allows for efficient transmission of acoustic energy to the wafer surfaces. |
| Compound Semiconductor Etching | Processing GaAs, InP, or SiC wafers in specialized chemical mixtures for optoelectronic device manufacturing. | Customizable slot geometry accommodates varying wafer thicknesses and fragile substrate materials. |
Technical Specifications
| Parameter | Specification Detail for PL-CP207 |
|---|---|
| Model Identifier | PL-CP207 |
| Material Construction | High-Purity Virgin PTFE (Custom PFA options available) |
| Wafer Size Compatibility | 6-Inch / 150mm Diameter |
| Geometry Configuration | Circular Cleaning Basket / Flower Basket Type |
| Chemical Compatibility | Universal resistance (Acids, Bases, Solvents, Oxidizers) |
| Temperature Tolerance | Suitable for cryogenic to high-temperature processing |
| Customization Capability | Fully customizable dimensions, slot counts, and handle configurations |
| Surface Finish | Precision-machined, ultra-smooth, non-porous |
| Batch Capacity | Custom designed to client specific wafer count requirements |
| Manufacturing Method | Bespoke CNC Machining / Custom Fabrication |
Why Choose This Product
- Uncompromising Material Quality: We utilize only the highest grade of fluoropolymers, ensuring that every carrier meets the strict trace-analysis requirements of the modern semiconductor industry.
- Expert Customization: Recognizing that every wet bench and process line is unique, we offer end-to-end custom CNC fabrication to tailor the dimensions, slot spacing, and handle designs to your specific operational needs.
- Proven Industrial Longevity: Our products are engineered for durability, offering a significantly lower total cost of ownership compared to commodity carriers that require frequent replacement due to chemical stress cracking.
- Strict Contamination Control: By focusing exclusively on high-performance fluoropolymers, we eliminate the risk of cross-contamination inherent in multi-material manufacturing environments.
- Responsive Engineering Support: Our technical team works directly with procurement and process engineers to ensure that the final product integrates perfectly with existing laboratory or production workflows.
For specialized requirements or to receive a tailored quotation for your specific application, please contact our technical sales team for a custom solution.
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Product Datasheet
PTFE Circular Wafer Carrier 6 Inch Acid Alkali Resistant Semiconductor Cleaning Basket Customizable
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