PTFE(Teflon) Labware
High Purity PTFE Wet Cleaning Flower Basket Single Wafer Etching Rack Customizable 4 Inch Mask Plate Carrier
Item Number : PL-CP66
Price varies based on specs and customizations
- Material
- 100% High-Purity Virgin PTFE
- Temperature Range
- -200°C to +260°C
- Customization Capability
- Full CNC Bespoke Fabrication (Size/Slots/Handle)
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Why Choose Us
Easy ordering process, quality products, and dedicated support for your business success.
Product Overview
This high-purity PTFE wet cleaning flower basket represents a critical advancement in substrate handling for microelectronics and semiconductor manufacturing. Engineered from premium virgin polytetrafluoroethylene, this system provides an uncompromising barrier against aggressive chemical reagents, ensuring that delicate wafers and mask plates remain free from metallic and organic contamination during critical processing stages. The unique architecture of the carrier facilitates optimal fluid dynamics, allowing for uniform exposure during etching, rinsing, and drying cycles.
Designed primarily for wet bench applications, this unit serves as a robust carrier for 4-inch wafers, mask plates, and various conductive glass substrates. Its utility extends across the semiconductor, photovoltaics, and advanced MEMS industries, where precision and material purity are paramount. Whether utilized in automated wet processing lines or manual laboratory dip-tanks, the equipment maintains structural integrity and chemical inertness under the most rigorous conditions.
By prioritizing industrial-grade durability and precision manufacturing, we offer a solution that mitigates the risks associated with substrate damage and process variability. This system is not merely a consumable but a precision-engineered tool designed to enhance process yields and ensure repeatability in high-stakes manufacturing environments. Our commitment to high-performance fluoropolymers ensures that every component meets the stringent cleanliness standards required for modern cleanroom operations.
Key Features
- Exceptional Chemical Universalism: Fabricated from 100% virgin PTFE, the equipment is virtually inert to all known acids, bases, and organic solvents, including hydrofluoric acid (HF), sulfuric acid (H2SO4), and potassium hydroxide (KOH).
- High-Temperature Thermal Stability: This system maintains its mechanical properties and dimensional stability across a broad thermal spectrum, from cryogenic temperatures up to 260°C, making it suitable for hot-acid etching processes.
- Optimized Fluid Dynamics: The open-grid "flower" design is engineered to minimize fluid entrapment and maximize chemical exchange, ensuring that reagents reach every millimeter of the substrate surface for uniform processing.
- Zero Metallic Contamination: Unlike metal-based or lower-grade polymer carriers, this unit is non-leaching and contains no fillers or additives, preserving the ionic purity of sensitive cleaning baths and semiconductor surfaces.
- Precision-Machined Slot Geometry: Every slot is CNC-machined to exacting tolerances, providing a secure fit that prevents substrate rattling or chipping while minimizing the contact area to prevent "shadowing" during the etching process.
- Low Friction Surface: The inherently low coefficient of friction of the material allows for the smooth insertion and removal of wafers, significantly reducing the risk of mechanical stress and breakage for thin or fragile substrates.
- Superior Dielectric Properties: The insulating nature of the material makes this carrier ideal for processes involving electrochemical or electrostatic considerations, providing a stable platform for various electronic component treatments.
- Bespoke Customization Options: Every unit can be tailored to specific dimensional requirements, including slot count, handle length, and substrate diameter, ensuring seamless integration into existing wet bench workflows.
- Structural Robustness: Despite its high purity, the material is engineered for longevity, resisting the embrittlement and cracking often associated with lower-performance plastics in corrosive environments.
Applications
| Application | Description | Key Benefit |
|---|---|---|
| Semiconductor Wafer Cleaning | Immersion of silicon wafers in RCA clean (SC-1 and SC-2) sequences to remove organic and metallic contaminants. | Prevents cross-contamination and ensures high-purity processing. |
| Wet Chemical Etching | Precision etching of thin films (SiO2, Si3N4) using hydrofluoric or phosphoric acid baths at elevated temperatures. | Maintains structural integrity in aggressive acid environments. |
| Mask Plate Processing | Specialized handling and cleaning of photomasks used in lithography to ensure defect-free pattern transfer. | Precision slotting prevents contact-induced damage to the mask surface. |
| Solar Cell Fabrication | Bulk processing of silicon wafers for texturing and phosphorus silicate glass (PSG) removal. | High throughput and durability in high-volume production cycles. |
| Conductive Glass Prep | Cleaning and preparation of ITO/FTO coated glass for optoelectronic and display manufacturing. | Minimal contact points prevent scratching of delicate conductive layers. |
| MEMS Development | Handling of multi-layered micro-electromechanical systems during complex sacrificial layer etching processes. | Chemical inertness ensures that delicate microstructures are not compromised. |
| Lab-Scale R&D | Small-batch substrate treatment in academic and industrial research for novel material development. | Versatile customization allows for non-standard substrate shapes and sizes. |
Technical Specifications
For the PL-CP66 series, all dimensions and configurations are subject to our bespoke CNC fabrication service to meet your specific process requirements.
| Parameter | Specification Details (Model: PL-CP66) |
|---|---|
| Material Composition | 100% High-Purity Virgin PTFE (Polytetrafluoroethylene) |
| Maximum Operating Temp | +260°C (Continuous) |
| Minimum Operating Temp | -200°C |
| Chemical Compatibility | Universal (pH 0-14); Resistant to HF, Aqua Regia, Piranha Solution |
| Standard Substrate Size | 4 inch (100mm) - Customizable for all diameters |
| Slot Configuration | Single-wafer or Multi-wafer variants available |
| Slot Depth/Width | Fully customizable to substrate thickness and stability needs |
| Handle Design | Fixed vertical, removable, or swing-style handles (Customizable) |
| Fabrication Method | Precision CNC Machining (Zero Molding Contamination) |
| Surface Finish | High-smoothness, low-porosity machined finish |
Why Choose Us
- Unrivaled Material Expertise: We specialize exclusively in high-performance fluoropolymers, ensuring that every carrier is built from the highest grade PTFE available, free from secondary recycled resins.
- Precision Engineering and Customization: Unlike standard injection-molded baskets, our CNC-machined units allow for infinite adjustments to slot width, depth, and overall geometry, matching your specific substrate requirements perfectly.
- Proven Industrial Reliability: Our carriers are trusted in Tier-1 semiconductor fabs and leading research institutions globally, where operational consistency and substrate safety are non-negotiable.
- Contamination-Free Manufacturing: Our end-to-end production process is designed to prevent the introduction of particles or metallic ions, ensuring that the equipment is cleanroom-ready upon delivery.
- Technical Support and Design Consultation: We provide comprehensive support to help you design the ideal carrier for your specific wet bench or chemical process, ensuring seamless integration.
Our engineering team is ready to assist you with a bespoke solution tailored to your precise process parameters. Contact us today for a technical consultation or a quote on custom PTFE flower baskets and wafer carriers.
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