PTFE(Teflon) Labware
Square PTFE Wafer Cleaning Basket Fluoropolymer Semiconductor Etching Rack Custom Silicon Wafer Carrier
Item Number : PL-CP89
Price varies based on specs and customizations
- Material
- High-Purity PTFE (Polytetrafluoroethylene)
- Temperature Resistance
- -200°C to +260°C
- Customization Options
- Fully Customizable Dimensions, Slots, and Styles
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Why Choose Us
Easy ordering process, quality products, and dedicated support for your business success.
Product Overview




This high-purity carrier system is engineered specifically for the rigorous demands of semiconductor fabrication, solar cell manufacturing, and advanced electronic component processing. Designed as a square-format cleaning rack, the unit provides a secure and chemically inert environment for transporting and processing sensitive substrates through aggressive wet chemical benches. By utilizing premium-grade polytetrafluoroethylene (PTFE), this system ensures that delicate wafers are protected from both mechanical damage and metallic contamination during critical cleaning, etching, and rinsing cycles.
Primarily utilized in cleanroom environments, the equipment serves as an essential interface between the robotic handling systems and the chemical processing baths. Its robust construction is tailored for industries where precision and purity are non-negotiable, including MEMS production, LED fabrication, and photovoltaic research. The system is built to withstand prolonged immersion in harsh acid and solvent baths, providing a reliable solution for high-throughput industrial workflows that require consistent results and long-term hardware durability.
In demanding industrial conditions, this unit demonstrates exceptional resilience against thermal shock and chemical degradation. The engineering focus remains on maintaining structural integrity under the stress of varying temperatures and corrosive environments. Procurement teams can rely on this system for its low maintenance requirements and its ability to maintain high-purity standards, ensuring that trace analysis and wafer yield are never compromised by the material properties of the carrier itself.
Key Features
- Superior Chemical Universal Inertness: Crafted from high-density fluoropolymer, the system is virtually impervious to almost all industrial chemicals, including aggressive acids like Hydrofluoric (HF), sulfuric acid, and strong oxidizers, ensuring zero leaching or contamination.
- High-Temperature Stability: The equipment maintains its mechanical properties and dimensional stability across a broad thermal range, allowing for safe operation in boiling chemical baths and high-temperature drying cycles without warping or degradation.
- Precision-Machined Slot Geometry: Utilizing advanced CNC fabrication, each slot is engineered with exact tolerances to provide a secure fit for square wafers, minimizing contact points to optimize fluid flow and prevent substrate chipping.
- Low Friction Surface Properties: The naturally low coefficient of friction inherent in the material prevents wafers from sticking or binding within the rack, facilitating smooth insertion and removal while reducing the risk of surface scratching.
- High-Purity Material Grade: Our selection of premium fluoropolymers ensures the absence of metallic ions and pigments, making this unit ideal for trace analysis applications and ultra-clean semiconductor processing environments.
- Enhanced Fluid Dynamics: The frame and base are designed with strategic drainage and flow-through ports to ensure rapid chemical exchange, thorough rinsing, and complete liquid evacuation, preventing "drag-out" contamination between baths.
- Structural Durability and Rigidity: Unlike molded alternatives, our machined construction offers superior wall thickness and reinforced joints, providing the mechanical strength necessary for repeated heavy-duty use in automated wet benches.
- Fully Customizable Architecture: From slot pitch and depth to overall dimensions and handle configurations, the entire system can be modified to meet specific process requirements and integrate seamlessly with existing laboratory or production equipment.
Applications
| Application | Description | Key Benefit |
|---|---|---|
| Silicon Wafer Etching | Substrate immersion in acidic etchants to remove surface layers or create specific textures. | Exceptional resistance to HF and Nitric acid mixtures. |
| Solar Cell Cleaning | Multi-stage cleaning of large-format square photovoltaic wafers before doping or coating. | High-volume handling capacity with minimal breakage. |
| MEMS Processing | Handling of micro-electromechanical systems during critical chemical release steps. | High-purity environment prevents microscopic contamination. |
| Ultrasonic Cleaning | Use within ultrasonic baths to remove sub-micron particulates from precision optics or electronics. | Damping properties protect delicate parts from vibration damage. |
| Trace Metal Analysis | Preparation and cleaning of labware in high-purity acid baths for analytical chemistry. | Lowest possible background interference for PPB-level detection. |
| LED Substrate Handling | Support for sapphire or silicon carbide wafers through aggressive cleaning and rinsing cycles. | Long-term reliability in high-temperature chemical processes. |
| Chemical Storage & Transport | Safe containment of sensitive substrates during transit between cleanroom modules. | Non-reactive surfaces protect wafer surface chemistry. |
| Laboratory Research | Custom-sized carrier for experimental material processing in university and R&D labs. | Adaptable design to fit non-standard experimental setups. |
Technical Specifications
As a specialist in fluoropolymer fabrication, we provide highly adaptable solutions for semiconductor and laboratory workflows. The following specifications represent the standard configuration for the PL-CP89 series, though all dimensions and features are fully customizable to meet specific industrial requirements.
| Specification Category | Parameter Details for PL-CP89 |
|---|---|
| Model Identification | PL-CP89 |
| Standard Dimensions | 249mm x 249mm (Square Configuration) |
| Material Composition | 100% High-Purity PTFE (Polytetrafluoroethylene) |
| Chemical Compatibility | Universal (Except molten alkali metals and elemental fluorine) |
| Temperature Range | -200°C to +260°C (-328°F to +500°F) |
| Fabrication Method | Full CNC Machining from solid billet |
| Wafer Capacity | Fully Customizable (Variable slot count and pitch) |
| Slot Width | Precision Machined (Customizable to wafer thickness) |
| Drainage Features | Integrated base and side flow ports for fluid exchange |
| Handle Options | Optional detachable or integrated PTFE handles available |
| Surface Finish | Smooth, non-porous machined finish to prevent particle entrapment |
| Compliance | RoHS Compliant, FDA grade raw materials |
Why Choose Us
Choosing our square PTFE cleaning basket ensures that your critical wet chemical processes are supported by the highest standard of engineering. Unlike generic molded carriers, this system is precision-machined from solid high-performance fluoropolymer, offering a level of durability and chemical purity that is essential for modern semiconductor and trace analysis applications. The inherent properties of the material—including its self-lubricating surface, extreme thermal resistance, and near-total chemical inertness—provide a reliable platform that minimizes substrate loss and maximizes process uptime.
Furthermore, our commitment to customization means that the equipment is designed around your specific workflow, rather than forcing your process to adapt to a standard size. Whether you require specific slot spacing for enhanced fluid dynamics or a reinforced frame for automated robotic handling, our end-to-end CNC capabilities allow us to deliver a bespoke solution that fits perfectly within your existing wet bench infrastructure.
- Unmatched Material Purity: We use only premium-grade PTFE to ensure your processes remain free from metallic and organic contaminants.
- Engineered for Longevity: The robust machined construction resists deformation and wear, even after thousands of cycles in aggressive chemical environments.
- Precision Customization: Every dimension, from the overall footprint to the internal slot geometry, can be tailored to your specific application requirements.
- Optimized Throughput: Design features like enhanced drainage and low-friction slots facilitate faster cycle times and safer wafer handling.
Our technical team is ready to assist you in designing the ideal carrier for your specific laboratory or production environment. Contact us today to discuss your custom dimensions and receive a comprehensive quote for your high-performance fluoropolymer solutions.
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Product Datasheet
Square PTFE Wafer Cleaning Basket Fluoropolymer Semiconductor Etching Rack Custom Silicon Wafer Carrier
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