PTFE(Teflon) Labware
Corrosion Resistant PTFE Reaction Trays and Custom Teflon Cassettes for Semiconductor Processing and High Purity Chemical Handling
Item Number : PL-CP168
Price varies based on specs and customizations
- Material Composition
- 100% Virgin High-Purity PTFE
- Temperature Range
- -200°C to +260°C
- Customization Level
- Full CNC Machined to Specifications
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Product Overview


This high-performance reaction and processing system is engineered from premium-grade Polytetrafluoroethylene (PTFE), specifically designed to withstand the most aggressive chemical environments encountered in modern industrial laboratories and semiconductor fabrication facilities. The equipment serves as a critical interface for wafer handling, chemical etching, and high-purity component cleaning, where traditional materials would fail due to corrosion or contamination. By utilizing 100% virgin PTFE, this unit ensures a non-reactive environment, maintaining the absolute integrity of sensitive samples and reagents across a broad thermal spectrum.
Primarily utilized in the semiconductor, aerospace, and pharmaceutical sectors, the system excels in processes requiring prolonged exposure to concentrated acids, bases, and organic solvents. Whether used as a reaction tray for bulk material processing or as a specialized cassette for substrate transport, the equipment provides the structural stability and chemical inertness necessary for reproducible results. Its design is optimized for both manual handling and integration into automated wet benches, making it a versatile tool for high-volume manufacturing and precision research alike.
Confidence in this system stems from its robust construction and meticulous manufacturing standards. Unlike molded alternatives that may contain internal stresses or impurities, each unit is crafted through advanced CNC machining processes. This approach guarantees dimensional stability and allows for the realization of complex geometries, such as intricate drainage patterns or specific ergonomic handling features. The result is a high-durability solution that offers long-term operational reliability, reducing replacement frequency and total cost of ownership in demanding industrial workflows.
Key Features
- Exceptional Chemical Inertness: Fabricated from high-density PTFE, the equipment is virtually impervious to all industrial chemicals, including hydrofluoric acid, aqua regia, and aggressive organic solvents, ensuring no leaching or contamination during critical processes.
- Superior Thermal Stability: The system maintains its mechanical properties and structural integrity across an expansive temperature range from -200°C to +260°C, allowing for use in cryogenic applications as well as high-temperature chemical reactions.
- Precision CNC Customization: Each unit can be tailored to exact specifications, including custom dimensions, specialized slotting for wafers, and unique drainage hole patterns to optimize fluid dynamics and reduce chemical drag-out.
- Non-Stick Surface Properties: The naturally low surface energy of the material prevents the adhesion of resins, polymers, and biological materials, facilitating rapid cleaning and cross-contamination prevention between different batches.
- Structural Durability and Impact Resistance: Engineered to withstand the rigors of industrial handling, the unit features thick-walled construction that resists warping and mechanical deformation, even under heavy loads or thermal cycling.
- High-Purity Material Origin: Using only virgin fluoropolymer resins, the equipment is free from fillers, pigments, or recycled content, making it suitable for trace analysis and ultra-cleanroom environments where ionic purity is paramount.
- Optimized Fluid Dynamics: Custom-machined drainage channels and perforated bases can be engineered to ensure rapid liquid evacuation, which is essential for consistent etching and rinsing cycles in semiconductor workflows.
- Ergonomic and Automated Handling Compatibility: The design can include integrated handles for safe manual transport or precise robotic grip points for seamless integration into automated chemical processing lines.
Applications
| Application | Description | Key Benefit |
|---|---|---|
| Semiconductor Wafer Etching | Securely holding 8-inch and 12-inch wafers during exposure to aggressive etchants like HF or KOH. | Zero metallic contamination and chemical resistance. |
| Trace Metal Analysis | Serving as a primary reaction tray for sample digestion or evaporation in analytical chemistry. | Lowest extractable levels for high-sensitivity results. |
| Pharmaceutical Synthesis | Carrying bulk reagents or intermediates through corrosive reaction stages or drying processes. | Non-reactive surface ensures product purity. |
| Battery Component Cleaning | Washing and drying electrode materials or separators in high-purity solvent baths. | Long-term durability in flammable solvent environments. |
| Aerospace Component Degreasing | Holding precision machined parts during ultra-sonic or chemical degreasing operations. | Resistance to heavy-duty industrial degreasers. |
| Solar Cell Processing | Supporting photovoltaic substrates during chemical bath deposition or texturing steps. | Uniform fluid flow and excellent chemical stability. |
| High-Temp Reaction Support | Used as a liner or secondary containment tray for hydrothermal or high-pressure reactions. | Maintains integrity at continuous +260°C usage. |
Technical Specifications
This product series is fundamentally built on a customizable platform to meet specific engineering requirements. All technical data provided below refers to the base material properties and standard fabrication capabilities for the PL-CP168 series.
| Parameter Category | Specification Detail | PL-CP168 Capabilities |
|---|---|---|
| Material | Type | 100% Virgin PTFE (Polytetrafluoroethylene) |
| Standard Formats | Wafer/Substrate Size | 8-inch (200mm), 12-inch (300mm), and Bespoke |
| Dimensions | Geometry | Square, Rectangular, or Round (Custom CNC) |
| Temperature Range | Operational Limits | -200°C to +260°C (-328°F to +500°F) |
| Chemical Resistance | pH Range | 0 - 14 (Full spectrum resistance) |
| Manufacturing Method | Fabrication | Precision CNC Machining / Milling |
| Surface Quality | Finish | Smooth, low-friction finish (Ra < 0.8μm) |
| Custom Features | Design Options | Slotted walls, perforated bases, integrated handles |
| Density | Physical Property | 2.14 – 2.20 g/cm³ |
| Tensile Strength | Mechanical Property | ≥ 25 MPa (depending on grade) |
| Dielectric Strength | Electrical Property | 18-40 kV/mm |
Note: Since the PL-CP168 is a fully customizable product line, dimensions, hole patterns, and wall thicknesses are manufactured according to customer-provided blueprints or technical requirements.
Why Choose PL-CP168
- Uncompromising Material Quality: We utilize only the highest grade of virgin PTFE, ensuring that every tray and basket provides the chemical inertness and purity required for the most sensitive industrial processes.
- Bespoke Engineering Expertise: Our advanced CNC fabrication capabilities allow us to move beyond standard catalog items, providing custom-engineered solutions that fit your specific equipment and workflow perfectly.
- Proven Industrial Longevity: Designed for durability, these units resist the typical degradation, cracking, and embrittlement associated with lower-quality plastics when exposed to harsh chemicals or thermal stress.
- Precision Manufacturing Standards: By employing high-tolerance machining instead of molding, we provide superior dimensional accuracy, which is essential for robotic handling and precise alignment in automated systems.
- Rapid Prototyping to Production: Our streamlined manufacturing process allows for quick turnaround on custom designs, from a single specialized prototype to high-volume production runs for full facility fit-outs.
For unique process requirements or specific dimensional needs, please contact our technical team to discuss a custom-fabricated solution tailored to your exact application standards.
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Product Datasheet
Corrosion Resistant PTFE Reaction Trays and Custom Teflon Cassettes for Semiconductor Processing and High Purity Chemical Handling
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